Secondary neutral-particle/ion mass spectrometer (SNMS/SIMS)

INFRASTRUCTURE

The secondary neutral particle / ion mass spectrometer (SNMS / SIMS) allows the analysis of concentration distributions in thin films and surface coatings by nanometer resolution.

It is suitable for the study of the depth distribution of the components of multi-layer systems with a unique layer thickness of up to 1-2 nm, for the study of the composition of the boundary layers deeper than the surface. It can also be used to study the depth distribution of additive components in semiconductor and polymer systems.

Technical parameters

Plasma Ar, Ne, Kr, Xe
Sputtering speed ~0,1 nm/s
Ion energy 100 eV – 2 keV
Mass spectrometer Balzers QMG 422
Accessable mass region 0 – 340 amu
Sensitivity 1 ppm
Depth resolution 1-2 nm
Sample holder heatable upto 600 oC
coolable upto -180 oC
x – y scanning possibility