Secondary neutral-particle/ion mass spectrometer (SNMS/SIMS)
INFRASTRUCTURE
The secondary neutral particle / ion mass spectrometer (SNMS / SIMS) allows the analysis of concentration distributions in thin films and surface coatings by nanometer resolution.
It is suitable for the study of the depth distribution of the components of multi-layer systems with a unique layer thickness of up to 1-2 nm, for the study of the composition of the boundary layers deeper than the surface. It can also be used to study the depth distribution of additive components in semiconductor and polymer systems.
Technical parameters
Plasma | Ar, Ne, Kr, Xe |
Sputtering speed | ~0,1 nm/s |
Ion energy | 100 eV – 2 keV |
Mass spectrometer | Balzers QMG 422 |
Accessable mass region | 0 – 340 amu |
Sensitivity | 1 ppm |
Depth resolution | 1-2 nm |
Sample holder | heatable upto 600 oC |
coolable upto -180 oC | |
x – y scanning possibility |